Sloppy, Winkler, Taheri and colleagues publish in Journal of Electronic Materials

Jennifer Sloppy, Christopher Winkler, and Dr. Taheri’s latest paper, titled “LaAlO3 / SrTiO3 epitaxial heterostructures by atomic layer deposition,” has been published in the Journal of Electronic Materials.

From the abstract: “Thin films of LaAlO3 were deposited on TiO2-terminated (100) SrTiO3 crystals by atomic layer deposition (ALD), using tris(iso-propylcyclopentadienyl)lanthanum and trimethyl aluminum precursors. Water was used as the oxidizer. The film composition was shown to be controlled by the ratio of La/Al precursor pulses during ALD, with near-stoichiometric LaAlO3 resulting at precursor pulse ratios of 4/1 to 5/1. Films near the stoichiometric LaAlO3 composition were shown to crystallize on subsequent annealing to form epitaxial LaAlO3/SrTiO3 heterostructures. . .”

The paper can be viewed directly here.

The paper can also be accessed on Springer’s website at Journal of Electronic Materials.

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